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3064 Kenneth Street

Santa Clara, CA  95054

To contact us:

Phone: 408-855-8686

Email: info@agsplasma.com

AGS Plasma Systems, Inc.

Etch Product Detail

The classic, high performance, value priced, RIE plasma tool used throughout the world for over ten years - and still going strong!

This system is your best bet when you have a variety of demanding applications.

The MPS-RIE is great for day-to-day use at the push of a button.

Product Summary

MPS-RIE Features

Modular Design for Ease of Maintenance

Single or Dual Chamber

Batch or Single Substrate

Small Foot Print

Stainless Steel or Aluminum Process Chambers

Cost Effective Process Solution

Automatic Process Controller using Windows®

MPS-XX0-RIE available in 50-150, 200, & 300 mm versions

Manual load or a variety of vacuum load locks are available.

The MPS series is also available as an OEM module to integrate to existing system platforms.

Best built R&D or low volume production tool available

Si, SiO2, SiNx, Metals, TiW, GaAs, resist, ILD and polyimide, micromachining (MEMS), photonics, HTSC's, and for failure analysis

Accepts any size substrate from 1" to 12" wafers, flat panels, or custom packages

Easy to use and simple to service

Safe, rugged design means high reliability with remarkable uptime

Simple 5 piece chamber construction is versatile and easy to upgrade

Multi-use process kit with virtually no process memory effect

Advanced Reactor technologies, such as RIE, RIE/PE, and ICP are available as standard modules.

Delivery: 90 days ARO
Warranty: 1 year parts & labor
Installation: Start up & training are available with the system
Service: Extended warranty &  PM's can be included

MPS-200-RIE —  Reactive Ion Etcher

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