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3064 Kenneth Street

Santa Clara, CA  95054

To contact us:

Phone: 408-855-8686

Email: info@agsplasma.com

AGS Plasma Systems, Inc.

HDP Product Detail

Using our standard MPS platform, this Inductively Coupled Plasma (ICP) tool can be helpful where high etch rates and low damage are required. AGS utilizes a compact, self contained, economical HDP plasma source.

Product Summary

MPS-ICP Features

Modular Design for Ease of Maintenance

Single or Dual Chamber

Batch or Single Substrate

Small Foot Print

Stainless Steel or Aluminum Process Chambers

Cost Effective Process Solution

Automatic Process Controller using Windows®

MPS-XX0-PECVD available in 50-150, 200, & 300 mm versions

Manual load or a variety of vacuum load locks are available.

The MPS series is also available as an OEM module to integrate to existing system platforms.

High-density tools offer the ability to produce a very reactive plasma with less radiation exposure to your substrate. Higher etch (or deposition) rates and lower processing temperatures are just two of the benefits of HDP's.

Our HDP system utilizes our basic RIE (or PECVD) platform and utilizes a patented, highly reliable, magnetically coupled plasma (MCP) source to produce high yield ion flux. MCP sources offer greater reliability over ECR sources due to our unique multi-coil design and by using lower frequencies. Normally used for etching, it is also available in a deposition version and either are field retrofitable.

 

Si, SiO2, SiNx, Metals, TiW, GaAs, resist, ILD and polyimide, micromachining (MEMS), photonics, HTSC's, and for failure analysis

Target focusing electromagnets fine tune process uniformity

Mixed frequency and pulsed RF options for stress control

Safe, rugged design means high reliability with remarkable uptime. Easy to use and simple to service

Delivery: 90 days ARO
Warranty: 1 year parts & labor
Installation: Start up & training are available with the system
Service: Extended warranty &  PM's can be included

MPS-300-ICP  —  High Density Plasma

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