AGS
Plasma Systems, Inc. 
MPS - PVD
Batch
Sputtering
A versatile multi-process PVD tool with flexible controls and excellent uniformity - all for a low price.
MPS-PVD Features
If you need reliability time after time when depositing films, the MPS Physical Vapor Deposition tool offers you the best value. Excellent process control and trouble-free operation can be yours.
- High performance PVD at a low cost
- Al, Au, AlSi, Cu, AlCuSi metallization
- SiO2, SiNx, TaN, TiNx films
- Low temperature passivation and ILD films for III-V and HTSC compounds
- Configure as single or multi-target deposition tool
- DC or RF sputtering options available
- Safety interlocks meet stringent requirements
- Low hydrogen containing films assured by using residual stripping cryo pump
- Unique "Direct-Connect" construction is easy to service or upgrade
MPS-PVD Delivery
Delivery: 90 days ARO
Warranty: 1 year parts & labor
Installation: Start up & training are included with the system
Service: 1 year of quarterly PM's can be included with each system
Extraordinary capability -
Excellent value
"A whole new plasma system"
For more information:
Please send your questions, comments, or suggestions to the AGS Sales desk
Copyright 1991-2004 AGS Plasma - All Rights Reserved
System 1700, APC-1000, & PlasmOps are trademarks of AGS Plasma.
Other trademarks are the property of their respective owners.
Prices and specifications subject to change without notice.
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